Effects of deposition temperature on the structural and optical properties of single crystalline rutile TiO2films

作者：Wang Weiguang; Wang Mingxian; Feng Xianjin^*; Zhao Wei; Luan Caina; Ma Jin

来源：Materials Chemistry and Physics, 2018, 211: 172.

DOI：10.1016/j.matchemphys.2018.02.023

• Crystal qualities
• Crystallinities
• Deposition temperatures
• Epitaxial relationships
• Low deposition temperature
• Single-crystalline rutile
• Structural and optical properties
• Titanium dioxides (TiO2)

Rutile phase titanium dioxide (TiO2) thin films were grown on α-Al2O3(100) substrates at different deposition temperatures (500–650 °C) by the metalorganic chemical vapor deposition method. The analyses of X-ray diffraction θ-2θscan indicated that the deposition temperature had an obvious influence on the crystal quality of the TiO2films. Single crystalline rutile TiO2films can be obtained from a relatively low deposition temperature of 500 °C–600 °C, and the film grown at 550 °C exhibited the best crystallinity, for which the composition and epitaxial relationship were identified. The effects of deposition temperature on the deposition rate and optical properties of the films have been investigated in detail.