Microstructure, Properties, and Grain Growth Kinetics of Mo-5Ta Refractory Sputtering Targets Prepared by SPS

作者：Liu, Dawei; Yang, Xiaolong; Huang, Lei; Pan, Yafei^*; Zhang, Jiuxing^*

来源：JOURNAL OF WUHAN UNIVERSITY OF TECHNOLOGY-MATERIALS SCIENCE EDITION, 2023, 38(6): 1248-1254.

DOI：10.1007/s11595-023-2816-z

• SPS
• Mo-5Ta targets
• structure
• properties
• grain growth kinetics

Mo-5Ta targets were prepared by the spark plasma sintering (SPS) technology under the sintering temperatures of 1 400-1 600 degrees C, the holding times of 0-20 min, and the axial pressure of 30 MPa. The microstructure, performance, and grain growth kinetics of Mo-5Ta sputtering targets were studied. With the increase of sintering temperatures and times, Ta can more dissolve in Mo and form a Mo(Ta) solid solution. The grain sizes of Mo-5Ta targets remain unchanged at low temperatures (1 400-1 500 degrees C) while increasing significantly at high temperature (1 600 degrees C) with the extension of the holding time. In addition, the densities and Vickers hardness (HV0.5) first ascend and then decrease with sintering proceeding. The thermal conductivity is positively correlated with the grain size and density, as a result of their joint action. Based on the comprehensive analysis, the grain growth is dominated by the combination of boundary diffusion and volume diffusion. When n=2, the activation energies of grain growth under holding times of 5, 10, 20 min are calculated as 762.70, 617.86, and 616.52 kJ/mol, respectively.