摘要

The nitrogen (N) doping effect on crystal structure, optical band gap, and localized states for amorphous/crys-talline GeTe films was studied. The crystallization temperature and sheet resistance were improved by N doping. The local bonding structure of amorphous and crystalline Nx(GeTe)1_x was elucidated by Raman spectra. The changes in optical band gap and localized states density for the films were evaluated by transmittance spectra. The band gap broadening after N doping is crucial to reducing the threshold current for phase change memory.

  • 单位
    南阳理工学院