Analysis and Optimization of a Novel Dual PM Vernier Machine with Halbach Array

摘要

In order to further improve the electromagnetic performance of permanent magnet vernier machine, a novel dual permanent magnet vernier machine (DPMVM) is proposed in this paper. The PMs with consequent-pole (CP) structure is embedded in the inner side of the rotor. The PMs are divided into blocks, and each PM is magnetized using the Halbach array. The arrangement has a more obvious magnetic concentration effect, which can significantly reduce the magnetic flux leakage to improve the air gap flux density. The stator side adopts a novel surface-mounted arrangement of permanent magnets for radial magnetization. This arrangement can improve average torque and power factor. The parametric model of the proposed DPMVM with 14 PM pole-pairs and 4 armature winding pole-pairs is established by finite element software. According to the sensitivity analysis of the parameters, the key parameters are optimized by single parameter scanning and response surface analysis, and the structural parameters of the machine are finally determined.

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