A low-cost fabrication method for high aspect ratio nano-channels by near-field UV exposure and thermal nanoimprinting

作者：Zhang, Wenlei; Yin, Zhifu; Sun, Lei^*

来源：Journal of Micromechanics and Microengineering, 2023, 33(8): 085010.

DOI：10.1088/1361-6439/ace266

• nano-channels
• near-field UV exposure
• Fresnel diffraction
• thermal nano-imprinting

A low-cost fabrication method for high aspect ratio nano-channels is proposed in this paper. The near-field exposure principle based on Fresnel diffraction was analyzed and the silicon nano-mold with the height of 962 & PLUSMN; 9 nm and width of 332 & PLUSMN; 12 nm was produced. Furthermore, the applicable demolding conditions for high aspect ratio nanoimprinting were studied, and the SU-8 nano-channels with the height of 947 & PLUSMN; 17 nm and width of 336 & PLUSMN; 13 nm were fabricated.

• 单位
  西安交通大学