Multi-planar image stitching method based on structural feature matching

Authors：Cao Fang; An Bowen; Qin Chuan

Source：IETE Technical Review (Institution of Electronics and Telecommunication Engineers, India), 2015, 32(4).

DOI：10.1080/02564602.2015.1012183

• Accumulated errors
• Curvature
• Exposure durations
• Geometric structure
• Image stitching
• Multi planar
• Structural feature
• Structural matching

In the paper, an optimal-seam-based multi-planar image stitching method using the feature matching of geometric structure is proposed. Based on the analysis of the brightness inconsistency caused by the exposure-duration difference and lens vignetting, the value of curvature is utilized as the matching structural feature in the calculation for the accumulated error on the stitching seam. Also, after the process of multi-plane detection, the searched optimal stitching seam is restricted to only pass through its corresponding planar structure constructed by the triangulation and homographic matrix, which can avoid the structural errors on the stitching seam and achieve satisfactory stitched results. Experimental results demonstrate the effectiveness of the proposed method.

• Institution
  上海海事大学