摘要
Memristors based on 2D semiconductors hold great promise due to their atomic-level thickness and tunable optoelectronic properties. However, a significant challenge lies in suppressing the large off-state current, which leads to additional standby power consumption. Here, a simple and versatile method is presented to address this issue by introducing a thin h-BN interlayer between 2D semiconductors and the electrodes. The thickness of the h-BN interlayer serves as a pivotal parameter for modulating the interfacial Schottky barrier, thereby influencing the off-state current level. This fabricated graphene/alpha-In2Se3/h-BN/Cr-Au memristor, forming a van der Waals heterostructure, exhibits unipolar resistive switching behavior. Remarkably, the memristor incorporating an 8 nm h-BN interlayer showcases an ultralow off-state current of 4.2 x 10-13 A, five orders of magnitude lower than that without the h-BN interlayer. It also achieves a current switching on/off ratio of up to 109 and realizes 32 distinct resistance states, enabling robust multi-bit memory capabilities. Excellent stability and durability are maintained due to the self-encapsulation of the h-BN interlayer. Furthermore, this method is also applicable to memristors built on HfS2, WS2, and WSe2, highlighting its broad potential for technological applications. @@@ Owing to the atomic thickness, memristors based on 2D semiconductors show a high off-state current, which leads to additional power consumption. This work designs a versatile device structure to achieve an ultralow off-state current in alpha-In2Se3 memristors by incorporating a thin h-BN interlayer. It also realizes 32 distinct resistance states, enabling robust multi-bit memory capabilities.image
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单位复旦大学; 电子科技大学