摘要

InGaAs infrared photodetectors subjected to irradiation environments undergo microstructural modifications and concomitant degradation, yet the underlying microscopic mechanism has not been fully studied. Herein, the influence of ? irradiation (total dose of 20 krad(Si)) on an In0.53Ga0.47 As/InP p-i-n focal plane array is studied by spatially resolved and temperature-dependent (3-290 K) photoluminescence (PL) measurements. By comparative PL studies of pre-irradiation and post-irradiation, the spatially resolved PL results of irradiation indicate that the in-plane uniformity of all PL features presents bigger fluctuations, meanwhile, the results of temperature-dependence PL demonstrate that the PL integral intensity related to impurities and interface-bound states is significantly weakened after irradiation. This can be attributed to the enhanced migration and reaction of defects caused by ? irradiation. Some mobile defects tend to migrate to lower energy regions, such as interfaces, and form defect complexes. In addition, some impurities combine with mobile defects and form inactive impurity-defect complexes. The findings reveal the effects of low-dose ? irradiation on InGaAs devices and may provide useful information for enhancing radiation resistance.

全文